Reliability Performance of Advanced Organic Interposer (CoWoS<sup>®</sup>-R) Packages
Organic interposer (CoWoS®-R) is one of the most promising heterogeneous integration platform solutions for high-speed and artificial intelligence applications. Components such as chiplets, high-bandwidth memory, and passives can be integrated into an organic interposer with excellent yield and reliability. This paper presents reliability results for advanced organic interposer packages. Multiple redistribution layers (RDLs) form an effective stress buffer for reducing the stress induced in the C4 joint and its underfill from the mismatch between the top dies and substrate. Four RDL lines with a minimum line width/spacing of 2/2 μm exhibited excellent robustness, ensuring the long functional lives of high performance computing products. We successfully demonstrated the outstanding fatigue performance of the C4 joint reliability. Various large packages passed stringent reliability tests, specifically TCC (−65°C to 150°C) up to 1300 cycles for heterogeneous integration package and TCG (−40°C to 125°C) up to 2500 cycles for chiplet integration package. The results of the sanity cross-sectional check indicate no interfacial delamination or crack. In addition, an in-depth analysis conducted using finite-element modeling revealed that the packages had superior reliability performance compared with a large monolithic flip-chip package. authors: Po-Yao Lin, Ming-Chih Yew, Shu-Shen Yeh, Suo-Mao Chen, Chia-Hsiang Lin, Chien-Shen Chen, Cheng Chi Hsieh, Yi-Hang Lin, Yung Jean Lu, Si-Guei Cheng, Shin-Puu Jeng
Interconnect
Interconnect
Interconnect is critically important for system performance. They are structures that connect two or more circuit elements (such as transistors) together electrically. In the past, interconnect was often referred to as on-chip interconnect of integrated circuits. Nowadays interconnect generally includes both on-chip interconnect of integrated circuits and off-chip interconnect in heterogeneous system integration. In interconnect design, geometric dimensions (width, thickness, spacing, aspect ratio, pitch), materials, process control and design layout are all critical to proper interconnect function, performance, power efficiency, reliability, and fabrication yield.
